IMEC reached agreement with ASML to install an ASML EUV pre-production tool in IMEC’s 300mm facility in 2010. This will enable IMEC and its partners to do research on 22nm CMOS on the world’s most advanced lithography system.

The installation of the pre-production tool follows ASML’s alpha-demo tool (ADT) at IMEC from which first high-resolution images were obtained with a Sn source (Philips Extreme UV) end of September. World first horizontal and vertical 35nm and 40nm lines and spaces in 100nm MET-2D resist (Rohm & Haas) at 18mJ/cm2 were successfully exposed with EUV using a Sn source.
Whereas the goal of the ADT is to pioneer the technology, demonstrate feasibility and build the infrastructure, the pre-production tool will exhibit considerably higher source power and optimized optics. This will enable full-scale development of EUV technology up to production worthy standards.

"These results mark a cornerstone in the development of EUV lithography. They represent the first real data, building confidence for EUV to be a viable technology for 32nm half pitch lithography and below," said Luc Van den hove, Executive Vice President and Chief Operating Officer at IMEC. "We are very pleased that our strategic partnership with ASML continues more than ever with the installation of one of the early EUV pre-production tools. Such advanced tools and successful collaboration are indispensable assets for doing advanced research with the world’s leading memory suppliers, logic IDMs and foundries."

"IMEC’s ability to help semiconductor companies explore new technologies has made it a trusted partner for the industry. IMEC’s order for one of our production-worthy EUV lithography systems is another sign how semiconductor manufacturers are gearing up to use EUV for ever-smaller features on chips," said Martin van den Brink, executive vice president of marketing and technology at ASML. "Our roadmap shows that ASML’s EUV systems have the potential to expose more than 100 wafers per hour, which is well above the minimum required for cost effective EUV chip manufacturing."

For more information:

Katrien Marent
Corporate Communication Manager
IMEC, Kapeldreef 75
B- 3001 Leuven, Belgium
Tel +32 16 28 18 80 Fax +32 16 28 16 37
Email: Katrien.Marent@imec.be

ASML
Lucas van Grinsven
Director of Corporate Communications
T: +31 40 268 3949
Email: lucas.van.grinsven@asml.com